Taufiqurrahman, M and Toifur, Moh. and Okimustava, Okimustava and Khusnani, Azmi (2020) Peer REVIEW_Effect Of Solution Temperature On Voltage Range And Sensitivity Of Lowtemperature Sensor Cu/Ni Results From Electroplating Assisted By Parallel Magnetic Fields. IAEME Publication.
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Abstract
This study aims to identify the effect of solution temperature aided by parallel magnetic fields on the sensitivity and voltage range of the Cu/Ni sensor as a low temperature sensor. Solution temperature was varied from 30°C-70°C. The results of data analysis showed that the highest sensitivity is a sensor which is deposited at a temperature of 60°C with a sensitivity level (0.118 ± 0.004) mV/°C with R2= 0.98 and sensor which has the lowest sensitivity sensor with the deposition temperature of 30°C is (0.0004 ± 0.007) mV/°C with R2= 0.96. In contrast to the sensitivity, the highest voltage range is 39.67 mV owned by the sensor which is deposited at 30°C and 60°C while the lowest voltage range is 32.04 mV as a result of the deposition temperature of 40°C.
| Item Type: | Other |
|---|---|
| Keyword: | Sensitivity, Voltage Range, Thin Film Cu/Ni, Electroplating, Parallel Magnetic Field |
| Subjects: | Q Science > QC Physics |
| Divisi / Prodi: | Faculty of Teacher Training and Education (Fakultas Keguruan dan Ilmu Pendidikan) > S1-Physics Education (S1-Pendidikan Fisika) |
| Depositing User: | M.Pd.Si. Oki Mustafa |
| Date Deposited: | 10 Dec 2022 03:34 |
| Last Modified: | 10 Dec 2022 03:43 |
| URI: | http://eprints.uad.ac.id/id/eprint/37887 |
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