setiamukti, danurdara and Toifur, Moh. and Okimustava, Okimustava (2020) PEER REVIEW_Effects Of Electrolyte Concentration On The Voltage Range And Response Time Of Cu/Ni Film For Low Temperature Sensor. IAEME Publication.
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Abstract
The Cu/Ni thin film has been made with the electroplating method assisted by
magnetic field parallel to electric field on the solution concentration variation. Electrolyte was made from the mixture of H3BO3, NiCl2, NiSO4, and H2O with the
content of each component is made more as many as 5 types those are C1-C5. Deposition is carried out using the Ni anode and the Cu cathode installed in the
distance of 4 cm, the electrolyte temperature of 60C, 2 minutes under influence of
200G magnetic fields. The characterization was done on the voltage range and the
sensor’s response time. The result shows that the voltage range is inversely
proportional to the response time. Sample of C3 has the smallest range of voltage and
the longest response time, while sample of C5 has the greatest range of voltage and
the shortest response time
| Item Type: | Other |
|---|---|
| Keyword: | Electroplating, parallel magnetic field, Cu/Ni film, voltage range, response time |
| Subjects: | Q Science > QC Physics |
| Divisi / Prodi: | Lembaga Pelatihan dan Pengembangan Softskill |
| Depositing User: | M.Pd.Si. Oki Mustafa |
| Date Deposited: | 10 Dec 2022 03:34 |
| Last Modified: | 10 Dec 2022 03:47 |
| URI: | http://eprints.uad.ac.id/id/eprint/37889 |
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